2017/09/20 星期三

职称类别: 教授 副教授 讲师 助教
首字分类:
A B C D E F G H I J K L M N O P Q R S T U V W X Y Z

方应翠

姓 名 方应翠

职 称 教授
职 务
所属系 真空与过程装备工程系
邮 箱 ycfang@hfut.edu.cn
电 话 18155169469
个人基本情况

教育经历
2002.8-2005.6 复旦大学 材料科学系,理学博士
1995.9-1998.7 中国科学院等离子体物理研究所,工学硕士
1986.9-1990.7 合肥工业大学 真空技术及设备专业,工学学士
工作经历
1998.7-至今  合肥工业大学真空工程系助教、讲师、副教授
2016.8-2016.9 瑞典皇家理工学院应用物理系,交流访问
2011.2-2012.2 美国佐治亚理工学院材料科学系,访问学者
2005.10-2008.10 中国科技大学微尺度国家实验室,博士后
1990.7-1995.8 安徽省芜湖市电子厂,助理工程师

主要研究方向
1. 薄膜和纳米颗粒的真空制备、表征和性能研究
2. 低能激光、等离子体与表面相互作用
3. 表面等离激元共振增强/阻尼特性
开设课程
《真空镀膜技术与设备》
《真空系统设计与计算》
《纳米技术》
近年的科研项目、专著与论文、专利、获奖

科研项目:
1. 国家自然科学基金面上项目,表面等离激元强衰减体系中热载流子产生、输运及光催化机制的研究, 2017-2020,62万,项目负责人。
2. 合作项目,聚变装置第一镜制备和表征,2015-2016,30万,项目负责人。
3. 合作项目,EAST多功能内部线圈导体接头真空检漏技术开发,2013-2015,15万,项目负责人。
4. 国家自然基金主任基金,等离子体尾场及光与物质的相互作用,2012-2014,20万,参与。

学术论文:
(1)Yingcui Fang*, Bing Zhang, Kang Zhang, Gongpu Li, Jun Jiang, Rong Yan and Junling Chen, Mechanism of photocatalytic activity improvement of AgNPs/TiO2 by oxygen plasma irradiation, Nanoscale, 2016, 38, 17004-17011.
(2)Yingcui Fang*, Jinjun He, Kang Zhang, Chuanyun Xiao, Bing Zhang, Jie Shen, Haihong Niu, Rong Yan and Junling Chen, Ar plasma irradiation improved optical and electrical properties of TiO2/Ag/ TiO2 multilayer thin film. Optic. Lett., 2015,40, 5455-5458.  
(3) Fang Yingcui*, Zhang B, Hong L, Yao D,  Xie Z and Jiang Y, Improvement of photocatalytic activity of silver nanoparticles by radio frequency oxygen plasma irradiation.  Nanotechnology, 2015, 26, 295204.  
(4)Yingcui Fang,Yang Zhang, Hongying Gao,Liuguo Chen, Bo Gao, Weizhen He, QiushiMeng, Chao Zhang, Zhenchao Dong, Modulation of porphyrin photoluminescence by nanoscale spacers on silicon substrates, Appl.Surf. Sci., 2013, 285, 572-576.
(5)Ying-cui Fang*,Liu Hong, Kuan-xiang Zhang, Xin Lu, Chun-mei Wang, Jun Yang, XiaoliangXu, Localized surface plasmon of Ag nanoparticles affected by annealing and its coupling with the excitons of Rhodamine 6G, J. Vac. Sci. Tech. A., 2013, 31, 041401.   
(6)Ying-cui Fang*, Kevin Blinn, Xiaxi Li, Guojun Weng, and Meilin Liu, Strong coupling between Rhodamine 6G and localized surface plasmon resonance of immobile Ag nanoclusters fabricated bydirect currentsputtering. Appl. Phys. Lett., 2013, 102, 143112.  
(7)Ying-cui Fang*, X. X. Li, K. Blinn, A. M. Mahmoud, and M. L. Liu, Resonant surface Enhancement of Raman scattering of Ag nanoparticles on silicon substrates fabricated by dcSputtering. J. Vac. Sci. Tech. A, 2012, 30, 050606.
(8)Xiaxi Li, Kevin Blinn, Ying-cui Fang, Mingfei Liu, Mahmoud A. Mahmoud, Shuang Cheng, Lawrence A. Bottomley, Mostafa El-Sayed and Meilin Liu, Applicationof surface enhanced Raman spectroscopy to the study of SOFC electrode surfaces.Phys. Chem. Chem. Phys., 2012, 14, 5919-5923.
(9)Zhang Kuan-Xiang, Wang wen, Zhao Jian-Hua, Hou Ji-Lai, Zhang Yan and Ying-cui Fang*, Hydrophilicity Difference of TiO2 Thin Films Induced by Different Plasmas. Physics Procedia, 2012, 32, 356-362.  
(10)Kuan-Xiang Zhang, Wen Wang, Ji-Lai Hou, Jian-Hua Zhao, Yan Zhang, Ying-Cui Fang*,Oxygen Plasma Induced Hydrophilicity of TiO2 Thin Films, Vacuum, 2011, 85, 990-993.   
(11)Y.C.Fang*, Z.J.Zhang and M.Lu, Room Temperature Photoluminescence Mechanism of SiOx Film after Annealing at Different Temperatures, J. of Lumi., 2007, 26, 145.    
(12)Y.C.Fang*, Z.J.Zhang, J. Shen and M.Lu, Photoluminescence from Electron-Beam Deposited CeO2 Thin Film after High Temperature Thermal Annealing, Chin. Phys. Lett., 2006, 23, 1919.   
(13)Y.C.Fang, Z.J.Zhang, Z.Q.Xie and Y.Y.Zhao, Photoluminescence Enhancement of Si Nanocrystals Embedded in SiO2 Matrix by Doping CeF3. Appl. Phy. Lett., 2005, 86, 191919.
(14)Y.C.Fang, Z.J.Zhang, Z.Q.Xie,and M. Lu, The effects of CeF3 doping on thephotoluminescence of Si nanocrystals embedded in a SiO2 matrix, Nanotechnology, 2005, 16, 769.    
(15)Y.C.Fang, Z.J.Zhang, Z.Q.Xie and Y.Y.Zhao, Photoluminescence from SiOx thin films: effects of film thickness and annealing temperature. Nanotechnology , 2004, 15, 494-500.   
(16)Y.C.Fang, W.Q. Li, L.J.Qi, L.Y.Li, Y.Y.Zhao, Z.J.Zhang and M.Lu, Photoluminescence of SiOx thin films after annealing at various temperatures, Chin. Phys. Lett., 2003, 11, 2042.    
(17)Y.C.Fang, W.Q. Li, L.J.Qi, Z.J.Zhang and M.Lu, Peak position of photoluminescence of Si Nanocrystals versus thickness of SiOx thin films, Chin. Phys. Lett., 2003, 12, 2252.  

主编教材:
《真空镀膜原理与技术》,科学出版社,2014.2出版。

授权发明专利:
(1)一种对硅量子点掺杂的方法(授权专利,CN200410025433.9)
(2)一种增强纳米银光催化特性的方法(ZL 2014 1 0188692.7)
(3)一种提高纳米银膜导电性的方法(ZL 2015 1 0121535.9)
(4)一种提高介质/金属/介质光学性能的方法(ZL 2015 1 0164428.4)

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